PSA Nitrogen Generators for Semiconductor Industry
Ensure product integrity, extend equipment life, and maintain ultra-high purity standards with our advanced on-site nitrogen generation systems designed specifically for semiconductor manufacturing and chip fabrication facilities.
Critical Semiconductor Applications
Our nitrogen generation systems support the most demanding semiconductor manufacturing processes.
Wafer Fabrication
Ultra-high purity nitrogen for wafer processing, cleaning, and handling to prevent oxidation and contamination during critical fabrication steps.
Chemical Vapor Deposition (CVD)
High-purity nitrogen atmospheres for CVD processes, ensuring precise thin film deposition without oxygen interference or impurities.
Plasma Etching
Controlled nitrogen atmospheres for plasma etching processes, maintaining precise pattern transfer and preventing unwanted oxidation.
Reflow Soldering
Inert nitrogen atmospheres for reflow soldering in chip packaging and assembly, reducing oxidation and improving solder joint quality.
Die Bonding
Nitrogen blanketing during die bonding processes to prevent oxidation and ensure optimal adhesion in semiconductor packaging operations.
Clean Room Pressurization
High-purity nitrogen for clean room pressurization and purging, maintaining contamination-free environments critical for semiconductor manufacturing.
Why Choose On-Site Nitrogen Generation
Eliminate supply chain dependencies and reduce costs with reliable on-site nitrogen production.
Ultra-High Purity
Achieve nitrogen purity up to 99.9999% with our advanced PSA technology and optional purification systems, meeting the strictest semiconductor industry standards.
Cost Reduction
Reduce nitrogen costs by up to 90% compared to liquid nitrogen delivery, with rapid ROI typically achieved within 12-24 months for high-volume semiconductor operations.
Continuous Supply
Eliminate supply interruptions and delivery delays with 24/7 on-demand nitrogen generation, ensuring uninterrupted semiconductor production.
Process Control
Maintain precise control over nitrogen purity, flow rate, and pressure with advanced PLC-based control systems and real-time monitoring.
Safety Enhancement
Eliminate risks associated with handling and storing cryogenic liquid nitrogen, improving workplace safety in semiconductor facilities.
Scalability
Easily scale nitrogen production capacity as your semiconductor manufacturing operations expand, without infrastructure limitations.
Technical Specifications
Engineered for precision and reliability in semiconductor manufacturing environments.
Purity Levels
- Standard high purity: 99.999% (5N) for general semiconductor applications
- Ultra-high purity: 99.9999% (6N) for critical wafer fabrication processes
- Optional Deoxo purification for oxygen levels <0.1 ppm
- Continuous purity monitoring with oxygen analyzer
System Specifications
- Flow rates: 10-2000 Nm³/hr (standard), higher capacities available
- Operating pressure: 4-10 bar(g), customizable for specific requirements
- Dew point: -40°C to -70°C (with optional dryer systems)
- PLC-based control with touch screen HMI and data logging
Advanced Features
- Automatic operation with minimal supervision required
- Remote monitoring and diagnostics capability
- Rapid startup time of 15-20 minutes
- Energy-efficient operation with low power consumption
Compliance & Standards
- ISO 9001:2015 certified manufacturing
- Meets SEMI standards for semiconductor equipment
- Clean room compatible design and materials
- Comprehensive documentation and validation support
Ready to Optimize Your Semiconductor Nitrogen Supply?
Contact us today to discuss your semiconductor manufacturing nitrogen requirements and discover how our PSA systems can enhance your operations.